LOW THRESHOLD CURRENT-DENSITY (100) GAINASP-INP DOUBLE-HETEROSTRUCTURE LASERS FOR WAVELENGTH 1.3-MU-M

被引:53
作者
ITAYA, Y
SUEMATSU, Y
KATAYAMA, S
KISHINO, K
ARAI, S
机构
[1] Department of Physical Electronics, Tokyo Institute of Technology, Tokyo
[2] Nippon Sheet Glass Co. Ltd., Osaka
关键词
D O I
10.1143/JJAP.18.1795
中图分类号
O59 [应用物理学];
学科分类号
摘要
Low threshold current density (100) GaInAsP/InP DH lasers emitting at 1.3 µm with thin active layer were studied experimentally and theoretically. The two phase solution growth technique was applied with low cooling rate of 0.08°C/min, which gave 0.05 µm thick uniform activelayer. The threshold current density was minimized down to 770 A/cm2with 0.13 µm thick active layer by reducing the concentration of Zn dopant, whereas the normal V–I characteristic was kept. The residual internal and the external absorption losses of the active layer were estimated to be about 70 cm-1and 30 cm-1, respectively, in order to know the theoretical threshold limit. The narrowest beam divergence obtained was 23µ for the active layer 0.05 –m thick. Both the threshold current density dependence on the thickness of the active layerand the beam divergence were in good agreement with the theory which was calculated by using the relative refractive index difference of 8.7%. A narrow stripe laser with undoped thin active layer had a tendency to emit in a single longitudinal mode. © 1979 IOP Publishing Ltd.
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页码:1795 / 1805
页数:11
相关论文
共 23 条
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