THERMOGRAVIMETRIC AND MOS CAPACITOR PROPERTIES FOR PBO-BI2O3-B2O3-SIO2 GLASS SYSTEM

被引：36

作者：

KOBAYASHI, K

机构：

[1] Toshiba ULSI Research Center, Kawasaki, 1-Komukai, Toshiba-cho

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1990年 / 124卷 / 2-3期

关键词：

D O I：

10.1016/0022-3093(90)90267-P

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Compositional dependencies of the thermogravimetric, thermomechanical and MOS characteristics for passivation and insulation PbOBi2O3B2O3SiO2 glass systems were studied. Deformation temperature, flow temperature and thermal expansion coefficient are slightly raised, when PbO is substituted for Bi2O3. The increase in molar polarizability has an adverse effect on the MOS capacitor characteristics, but OH content does not affect them. Glasses of this system are good candidates for device passivation and insulation. © 1990.

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页码：229 / 232

页数：4

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