OPTICAL WAVE-GUIDES IN KTA1-XNBXO3 PRODUCED BY HE ION-IMPLANTATION

被引：13

作者：

FLUCK, D ^{[1
]}

GUTMANN, R ^{[1
]}

GUNTER, P ^{[1
]}

IRMSCHER, R ^{[1
]}

机构：

[1] FORSCHUNGSZENTRUM JULICH, ISI FORSCH ZENTRUM, W-5170 JULICH 1, GERMANY

来源：

JOURNAL OF APPLIED PHYSICS | 1991年 / 70卷 / 09期

关键词：

D O I：

10.1063/1.348993

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

MeV He ion implantation is used to produce optical waveguides in KTa1-xNbxO3 (x = 0.37). The detailed refractive index profiles of the implanted planar waveguides are reconstructed from the measured mode spectra at the wavelength of 632.8 nm. The absorption and the tunneling losses of the lowest mode of the waveguides are determined. Ionic collision is proposed to be the mechanism which causes the observed variation of the refractive index.

引用

页码：5147 / 5149

页数：3