ULTRAVIOLET-LASER FABRICATION OF STRONG, NEARLY POLARIZATION-INDEPENDENT BRAGG REFLECTORS IN GERMANIUM-DOPED SILICA WAVE-GUIDES ON SILICA SUBSTRATES

被引：20

作者：

STRASSER, TA

ERDOGAN, T

WHITE, AE

MIZRAHI, V

LEMAIRE, PJ

机构：

[1] AT and T Bell Laboratories, Murray Hill

来源：

APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 26期

关键词：

D O I：

10.1063/1.112443

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Strong Bragg reflectors (≳4 nm width) have been fabricated in Ge-doped silica waveguides on silica substrates by ultraviolet (UV)-induced refractive index change. Index changes in excess of 3×10-3 were obtained by deuterium sensitization. The passband quality, polarization dependence, and loss of the reflectors are reported. © 1994 American Institute of Physics.

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页码：3308 / 3310

页数：3

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