INCREASE IN PHOTOSENSITIVITY IN SILICA-BASED OPTICAL WAVE-GUIDES ON SILICON

被引：5

作者：

HIBINO, Y ^{[1
]}

ABE, M ^{[1
]}

YAMADA, H ^{[1
]}

OHMORI, Y ^{[1
]}

BILODEAU, F ^{[1
]}

MALO, B ^{[1
]}

HILL, KO ^{[1
]}

机构：

[1] COMMUN RES CTR,OTTAWA K2H 8S2,ONTARIO,CANADA

来源：

ELECTRONICS LETTERS | 1993年 / 29卷 / 07期

关键词：

OPTICAL WAVE-GUIDES; PHOTOREFRACTIVE MATERIALS; INTEGRATED OPTICS;

D O I：

10.1049/el:19930416

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An increase in the photoinduced refractive-index change DELTAn in silica-based optical waveguides on silicon is described. The increase is attained by the consolidation of a core film in a reducing atmosphere. A maximum DELTAn of 3-9 x 10(-4) is obtained for the TE mode by UV laser irradiation at 248 nm. This is four times larger than that in conventional waveguides.

引用

页码：621 / 623

页数：3

共 6 条

[1]

HIBINO Y, 1991, IEEE PHOTONIC TECH L, V1, P640

[2] PHOTOSENSITIVITY IN OPTICAL FIBER WAVEGUIDES - APPLICATION TO REFLECTION FILTER FABRICATION [J].