EFFECTS OF TA ADDITION IN CONI/CR DOUBLE-LAYER FILM SPUTTERED IN LOW AR GAS-PRESSURE

被引：7

作者：

KAWANABE, T

NAOE, M

机构：

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1988年 / 24卷 / 06期

关键词：

D O I：

10.1109/20.92224

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

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页码：2721 / 2723

页数：3

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