FORMATION OF AMORPHOUS SILICIDE NANOCLUSTERS IN CHROMIUM-IMPLANTED AND TITANIUM-IMPLANTED SILICA

被引：16

作者：

CATTARUZZA, E

MATTEI, G

MAZZOLDI, P

BERTONCELLO, R

BATTAGLIN, G

MIRENGHI, L

机构：

[1] INFM,DIPARTIMENTO CHIM FIS,I-30123 VENICE,ITALY

[2] CNRSM,PASTIS,I-72100 BRINDISI,ITALY

[3] DIPARTIMENTO CIMA,I-35131 PADUA,ITALY

[4] CONSORZIO INCM,I-35131 PADUA,ITALY

来源：

APPLIED PHYSICS LETTERS | 1995年 / 67卷 / 19期

关键词：

D O I：

10.1063/1.114817

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Amorphous nanoclusters of chromium and titanium silicides have been synthesized by implanting 35 keV chromium and 30 keV titanium ions, at a fluence of 1X10(17) cm(-2) in amorphous silica. The cluster stoichiometries were [Cr]/[Si]=1.6+/-0.3 and [Ti]/[Si]=1.1+/-0.3, respectively, as obtained by energy dispersive spectroscopic x-ray microanalysis and confirmed by x-ray photoelectron spectroscopy analysis, Titanium-implanted ions are more reactive than chromium ones in terms of the formation of chemical bonds with silicon of the host silica matrix. (C) 1995 American Institute of Physics.

引用

页码：2884 / 2886

页数：3

共 14 条

[1] CHEMICAL ASPECTS IN COPPER-IMPLANTED FUSED-SILICA AND SODA-LIME GLASSES
BERTONCELLO, R
TRIVILLIN, F
CATTARUZZA, E
MAZZOLDI, P
ARNOLD, GW
BATTAGLIN, G
CATALANO, M
[J]. JOURNAL OF APPLIED PHYSICS, 1995, 77 (03) : 1294 - 1300
[2] CHEMICAL INTERACTIONS IN TITANIUM-IMPLANTED AND TUNGSTEN-IMPLANTED FUSED-SILICA
BERTONCELLO, R
GLISENTI, A
GRANOZZI, G
BATTAGLIN, G
CACCAVALE, F
CATTARUZZA, E
MAZZOLDI, P
[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1993, 162 (03) : 205 - 216
[3] A MONTE-CARLO COMPUTER-PROGRAM FOR THE TRANSPORT OF ENERGETIC IONS IN AMORPHOUS TARGETS
BIERSACK, JP
HAGGMARK, LG
[J]. NUCLEAR INSTRUMENTS & METHODS, 1980, 174 (1-2): : 257 - 269
[4] BRIGGS D, 1983, PRACTICAL SURFACE AN
[5] CATTARUZZA E, IN PRESS J MATER RES
[6] IMPLANTATION OF QUARTZ WITH HIGH-DOSE TITANIUM IONS AS STUDIED BY X-RAY PHOTOELECTRON-SPECTROSCOPY
ERMOLIEFF, A
MARTHON, S
MARTIN, P
PIERRE, F
DUFOUR, M
[J]. SOLID STATE COMMUNICATIONS, 1992, 82 (07) : 517 - 519
[7] FORMATION OF OXYGEN-DEFICIENT TYPE STRUCTURAL DEFECTS AND STATE OF IONS IN SIO2 GLASSES IMPLANTED WITH TRANSITION-METAL IONS
HOSONO, H
WEEKS, RA
IMAGAWA, H
ZUHR, R
[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1990, 120 (1-3) : 250 - 255
[8] ELECTRICAL SURFACE CONDUCTIVITY IN QUARTZ INDUCED BY ION-IMPLANTATION
MARTIN, P
DUFOUR, M
ERMOLIEFF, A
MARTHON, S
PIERRE, F
DUPUY, M
[J]. JOURNAL OF APPLIED PHYSICS, 1992, 72 (07) : 2907 - 2911
[9] EVALUATION OF TETRA-ALKYLCHROMIUM PRECURSORS FOR ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION .1. FILMS GROWN USING CR[CH2C(CH3)3]4
MAURY, F
OSSOLA, F
[J]. THIN SOLID FILMS, 1992, 207 (1-2) : 82 - 89
[10] PECULIARITIES AND APPLICATION PERSPECTIVES OF METAL-ION IMPLANTS IN GLASSES
MAZZOLDI, P
ARNOLD, GW
BATTAGLIN, G
BERTONCELLO, R
GONELLA, F
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1994, 91 (1-4) : 478 - 492

← 1 2 →