INTERFACIAL CUAL2 PRECIPITATE NUCLEATION AND GROWTH DURING THE DEPOSITION OF AL-4-PERCENT CU-1.5-PERCENT SI ALLOYS

被引:14
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THOMAS, ME
KEYSER, TK
GOO, EKW
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10.1063/1.336763
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O59 [应用物理学];
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页码:3768 / 3773
页数:6
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