WORK FUNCTION OF ULTRAHIGH-VACUUM-DEPOSITED BERYLLIUM FILMS

被引：19

作者：

DIXON, RD

LOTT, LA

机构：

[1] Dow Chemical Company, Rocky Flats Division, Golden

来源：

JOURNAL OF APPLIED PHYSICS | 1969年 / 40卷 / 12期

关键词：

D O I：

10.1063/1.1657317

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The work function of ultrahigh-vacuum-deposited beryllium films was measured to be 5.08±0.08 eV. Upon exposure of freshly deposited films to pure oxygen at pressures of 5×10-7 Torr, the work function was observed to decrease rapidly to a stable value of 3.60±0.05 eV. © 1969 The American Institute of Physics.

引用

页码：4938 / &

共 6 条

[1] EFFECT OF MERCURY CONTAMINATION ON WORK FUNCTION OF GOLD - (CONTACT POTENTIAL DIFFERENCE NEW VALUE FOR AU WORK FUNCTION 5.22+-3.05 EV E)
HUBER, EE
[J]. APPLIED PHYSICS LETTERS, 1966, 8 (07) : 169 - &
[2] ADSORPTION OF NITROGEN HYDROGEN OXYGEN AND CARBON MONOXIDE ON A BERYLLIUM FILM
HURD, JT
ADAMS, RO
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 229 - &
[3] INTRINSIC FIELDS IN THIN INSULATING FILMS BETWEEN DISSIMILAR ELECTRODES
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[J]. PHYSICAL REVIEW LETTERS, 1963, 10 (01) : 10 - &
[4] ORIENTATION OF VACUUM-DEPOSITED BE THIN FILMS
VERDERBER, RR
[J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (05) : 1643 - &
[5] VACUUM THERMIONIC WORK FUNCTIONS OF POLYCRYSTALLINE BE TI CR FE NI CU PT AND TYPE 304 STAINLESS STEEL
WILSON, RG
[J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) : 2261 - &
[6] A new method of measuring contact potential differences in metals
Zisman, WA
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1932, 3 (07) : 367 - 370

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