INITIAL EPITAXIAL-GROWTH OF COPPER SILICIDE ON SI(111) STUDIED BY LOW-ENERGY ELECTRON-MICROSCOPY AND PHOTOEMISSION ELECTRON-MICROSCOPY

被引:54
作者
MUNDSCHAU, M
BAUER, E
TELIEPS, W
SWIECH, W
机构
[1] WROCLAW B BEIRUT UNIV,INST EXPTL PHYS,PL-50205 WROCLAW,POLAND
[2] SONDERFORSCH BEREICH 126 GOETTINGEN CLAUSTHAL,D-3392 CLAUSTHAL ZELLERFE,FED REP GER
关键词
D O I
10.1063/1.343227
中图分类号
O59 [应用物理学];
学科分类号
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页码:4747 / 4752
页数:6
相关论文
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