KINETIC-STUDY ON CHEMICAL VAPOR-DEPOSITION OF TITANIUM DISULFIDE THIN-FILM

被引：25

作者：

KANEHORI, K

KIRINO, F

ITO, Y

MIYAUCHI, K

KUDO, T

机构：

来源：

关键词：

D O I：

10.1149/1.2096903

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1265 / 1270

页数：6

共 16 条

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[4] TITANIUM DISULFIDE FILMS FABRICATED BY PLASMA CVD
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ITO, Y
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KUDO, T
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[7] CHEMICAL VAPOR-DEPOSITION OF TITANIUM DISULFIDE
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[9] NON-AQUEOUS LITHIUM CELLS
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