EFFECT OF SUBSTRATE POTENTIAL ON AL2O3 FILMS PREPARED BY ELECTRON-BEAM EVAPORATION

被引：15

作者：

HOFFMAN, D

LEIBOWIT.D

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1972年 / 9卷 / 01期

关键词：

D O I：

10.1116/1.1316596

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：326 / &

共 6 条

[1] BERRY RW, 1968, THIN FILM TECHNOLOGY, P153
[2] IMPROVED DIELECTRIC FILMS FOR MULTILAYER COATINGS AND MIRROR PROTECTION
COX, JT
HASS, H
RAMSEY, JB
[J]. JOURNAL DE PHYSIQUE, 1964, 25 (1-2): : 250 - 254
[3] PREPARATION, STRUCTURE, AND APPLICATIONS OF THIN FILMS OF SILICON MONOXIDE AND TITANIUM DIOXIDE
HASS, G
[J]. JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1950, 33 (12) : 353 - 360
[4] A12O3 FILMS PREPARED BY ELECTRON-BEAM EVAPORATION OF HOT-PRESSED A12O3 IN OXYGEN AMBIENT
HOFFMAN, D
LEIBOWITZ, D
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1971, 8 (01): : 107 - +
[5] HOLLAND L, 1958, VAC DEPOSITION THIN, P487
[6] HOLMESSIEDLE A, 1971, IEEE C NUCLEAR SPACE