METHANE ACTIVATION ON CLEAN AND OXIDIZED NI(100)

被引：48

作者：

CAMPBELL, RA ^{[1
]}

SZANYI, J ^{[1
]}

LENZ, P ^{[1
]}

GOODMAN, DW ^{[1
]}

机构：

[1] TEXAS A&M UNIV SYST,DEPT CHEM,COLL STN,TX 77843

来源：

CATALYSIS LETTERS | 1993年 / 17卷 / 1-2期

关键词：

METHANE ACTIVATION; THIN FILM NICKEL OXIDE; NI(100);

D O I：

10.1007/BF00763925

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The activation of methane was investigated on a clean and oxidized Ni(100) surface in the pressure range of 0.05-1.0 Torr. The results are most consistent with a precursor mediated mechanism being primarily responsible for the reactive sticking of methane on the clean Ni(100) surface. This contrasts with the Ni(111) surface where dissociative adsorption has been determined to occur predominantly through the direct mechanism. The reaction probability of methane on the NiO films was significantly lower than that observed for the clean Ni(100) surface and exhibited an apparent activation energy of 8.8 +/- 1.1 kcal/mol. The results suggest that methane activation on NiO occurs on defect metallic nickel sites.

引用

页码：39 / 46

页数：8

共 21 条

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