POSITRON MOBILITY IN SI AT 300-K

被引:22
作者
MAKINEN, J [1 ]
CORBEL, C [1 ]
HAUTOJARVI, P [1 ]
VEHANEN, A [1 ]
MATHIOT, D [1 ]
机构
[1] CTR NATL ETUD TELECOMMUN,F-38243 MEYLAN,FRANCE
来源
PHYSICAL REVIEW B | 1990年 / 42卷 / 03期
关键词
D O I
10.1103/PhysRevB.42.1750
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Positron motion in an electric field is studied experimentally by measuring the drift length of positrons in the space-charge region of a Au-Si surface-barrier diode. An electric field of the order of 104 V/cm gives rise to a drift length from 2 to 3 m. The drift-diffusion approximation can explain positron transport up to an electric-field strength of 3×104 V/cm. At 300 K we get a positron mobility of 120±10 cm2/V s in Czochralski-grown Si ([P]=7.4×1014 cm-3), and the diffusion coefficient calculated from the Einstein relation is 3.0±0.25 cm2/s. Positron diffusion was measured without preparing a metal-semiconductor contact in high-purity floating-zone Si (104 cm) assuming the electric field can be neglected. The diffusion coefficient is 3.10±0.20 cm2/s, in good agreement with that based upon the positron mobility measured under an electric field. © 1990 The American Physical Society.
引用
收藏
页码:1750 / 1758
页数:9
相关论文
共 33 条
[31]   MONTE-CARLO CALCULATIONS OF KEV ELECTRON AND POSITRON SLOWING DOWN IN SOLIDS .2. [J].
VALKEALAHTI, S ;
NIEMINEN, RM .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1984, 35 (01) :51-59
[32]   MONTE-CARLO CALCULATIONS OF KEV ELECTRON AND POSITRON SLOWING DOWN IN SOLIDS [J].
VALKEALAHTI, S ;
NIEMINEN, RM .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1983, 32 (02) :95-106
[33]   PROFILING MULTILAYER STRUCTURES WITH MONOENERGETIC POSITRONS [J].
VEHANEN, A ;
SAARINEN, K ;
HAUTOJARVI, P ;
HUOMO, H .
PHYSICAL REVIEW B, 1987, 35 (10) :4606-4610