EFFECT OF ADSORBATES AND INSULATING LAYERS ON THE CONDUCTANCE OF PLASMA DEPOSITED A-SI-H

被引：56

作者：

TANIELIAN, M ^{[1
]}

CHATANI, M ^{[1
]}

FRITZSCHE, H ^{[1
]}

SMID, V ^{[1
]}

PERSANS, PD ^{[1
]}

机构：

[1] UNIV CHICAGO,DEPT PHYS,CHICAGO,IL 60637

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1980年 / 35-6卷 / JAN-期

关键词：

D O I：

10.1016/0022-3093(80)90656-0

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：575 / 580

页数：6

相关论文

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