STRUCTURE AND ELECTRICAL PROPERTIES OF SPUTTERED FILMS OF HAFNIUM AND HAFNIUM COMPOUNDS

被引：36

作者：

SMITH, FTJ

机构：

来源：

关键词：

D O I：

10.1063/1.1658440

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4227 / &

共 10 条

[1] ELECTRONIC PROPERTIES OF TITANIUM MONOXIDE [J].

DENKER, SP .

[2]

ERN V, 1965, PHYS REV, V137, P1927

[3]

GULDNER WG, 1964, IEEE T COMPONENT PAR, V9, P9

[4]

Hansen M., 1958, J ELECTROCHEM SOC, DOI DOI 10.1149/1.2428700

[5]

HUBER F, 1966, IEEE T COMPONENT PAR, V11, P324

[6] THIN FILMS DEPOSITED BY BIAS SPUTTERING [J].

MAISSEL, LI ;

SCHAIBLE, PM .

[7]

MOTT NF, 1936, METALS ALLOYS, P286

[8]

SCHUETZE HJ, 1963, 10 T NAT VAC S, P434

[9]

SCHWARTZ N, 1964, PHYSICS THIN FILMS, V2

[10]

SCHWARTZ N, 1962, 8 T NAT VAC S, V2