THIN FILMS DEPOSITED BY BIAS SPUTTERING

[1] BENJAMIN P, 1961, P ROY SOC LONDON, VA261, P516

[2] BOWDEN P, 1962, 5 INT C EL MICR

[3] PROPERTIES OF THIN ANTIMONY FILMS DEPOSITED IN HIGH VACUUM [J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (02) : 323 - &

[4] SUPERCONDUCTIVE FILMS MADE BY PROTECTED SPUTTERING OF TANTALUM OR NIOBIUM [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (05) : 1898 - &

[5] EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) : 402 - &

[6] HONIG RE, 1961, 5 C ION PHEN GAS MUN, P106

[7] LOEB LB, 1960, BASIC PROCESSES GAST, P765

[8] MAISSEL LI, 1963, P IEEE ELECTRONIC CO

[9] MAISSEL LI, 1963, VACUUM, V13, P421

[10] MILLER GL, 1959, TANTALUM NIOBIUM, P358

[1] BENJAMIN P, 1961, P ROY SOC LONDON, VA261, P516

[2] BOWDEN P, 1962, 5 INT C EL MICR

[3] PROPERTIES OF THIN ANTIMONY FILMS DEPOSITED IN HIGH VACUUM [J]. JOURNAL OF APPLIED PHYSICS, 1961, 32 (02) : 323 - &

[4] SUPERCONDUCTIVE FILMS MADE BY PROTECTED SPUTTERING OF TANTALUM OR NIOBIUM [J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (05) : 1898 - &

[5] EFFECTS OF NITROGEN METHANE + OXYGEN ON STRUCTURE + ELECTRICAL PROPERTIES OF THIN TANTALUM FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1964, 35 (02) : 402 - &

[6] HONIG RE, 1961, 5 C ION PHEN GAS MUN, P106

[7] LOEB LB, 1960, BASIC PROCESSES GAST, P765

[8] MAISSEL LI, 1963, P IEEE ELECTRONIC CO

[9] MAISSEL LI, 1963, VACUUM, V13, P421

[10] MILLER GL, 1959, TANTALUM NIOBIUM, P358