MO/Y MULTILAYER MIRRORS FOR THE 8-12-NM WAVELENGTH REGION

被引：14

作者：

MONTCALM, C

SULLIVAN, BT

RANGER, M

SLAUGHTER, JM

KEARNEY, PA

FALCO, CM

CHAKER, M

机构：

[1] UNIV QUEBEC,INST NATL RECH SCI ENERGIE & MAT,VARENNES J3X 1S2,PQ,CANADA

[2] UNIV ARIZONA,CTR OPT SCI,TUCSON,AZ 85721

[3] UNIV ARIZONA,DEPT PHYS,TUCSON,AZ 85721

来源：

OPTICS LETTERS | 1994年 / 19卷 / 13期

关键词：

D O I：

10.1364/OL.19.001004

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Mo/Y multilayer mirrors were deposited by dc magnetron sputtering under different deposition conditions. They were characterized by reflectance measurements at normal and grazing angles of incidence, by transmission electron microscopy, and by Auger depth profiling. Normal-incidence peak reflectances of 34% and 22% were measured at wavelengths of 11.5 and 8.1 nm, respectively. Interface roughness and contamination of the layers during deposition limit the peak reflectance of these Mo/Y mirrors.

引用

页码：1004 / 1006

页数：3

共 7 条

[1]

DEBOER FR, 1988, COHESION METALS TRAN, P344

[2] X-RAY INTERACTIONS - PHOTOABSORPTION, SCATTERING, TRANSMISSION, AND REFLECTION AT E=50-30,000 EV, Z=1-92 [J].