MULTILAYER MIRROR TECHNOLOGY FOR SOFT-X-RAY PROJECTION LITHOGRAPHY

被引：124

作者：

STEARNS, DG ^{[1
]}

ROSEN, RS ^{[1
]}

VERNON, SP ^{[1
]}

机构：

[1] VERNON APPL PHYS, TORRANCE, CA 90505 USA

来源：

APPLIED OPTICS | 1993年 / 32卷 / 34期

关键词：

D O I：

10.1364/AO.32.006952

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Recent advances in multilayer mirror technology meet many of the stringent demands of soft-x-ray projection lithography (SXPL). The maximum normal-incidence reflectivity achieved to date is 66% for Mo/Si multilayers at a soft-x-ray wavelength of 13.4 nm, which is sufficient to satisfy the x-ray throughput requirements of SXPL. These high-performance coatings can be deposited on figured optics with layer thickness control of approximately 0.5%. Uniform multilayer coatings are required for SXPL imaging optics, for which maintaining the surface figure is critical to achieving diffraction-limited performance. In contrast the coatings on the condenser optics will be graded to accommodate a large range of angles of incidence. Graded multilayer coatings can also be used to modify the figure of optical substrates without increasing the surface roughness. This offers a potential method for precise fabrication of aspheric imaging optics.

引用

页码：6952 / 6960

页数：9

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