REDUCTION IMAGING AT 14 NM USING MULTILAYER-COATED OPTICS - PRINTING OF FEATURES SMALLER THAN 0.1-MU-M

We demonstrate high resolution reduction imaging in the soft x-ray spectral region using multilayer-coated reflective optics. In particular, a Schwarzschild objective was used at 20:1 reduction with 14 nm radiation to image line and space features from a transmission mask onto a resist-coated silicon wafer with a resolution better than 0.1-mu-m. The mirrors of the objective were coated with Mo/Si multilayers to provide nearly 40% reflectance at near-normal incidence for the 14 nm radiation. Our results demonstrate that multilayer coatings are capable of enhancing the reflectance of optical components at soft x-ray wavelengths without significantly degrading their imaging performance.