HIGH-INTENSITY, HEAVY NEGATIVE-ION SOURCES BASED ON THE SPUTTER PRINCIPLE

被引：13

作者：

ALTON, GD

机构：

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1994年 / 65卷 / 04期

关键词：

D O I：

10.1063/1.1145040

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Due to their ease of operation, simplicity, long lifetime, and wide range of species capabilities, negative ion sources predicated on the sputter principle are being used for an increasing number of diverse applications. Sources based on this technology have been developed which utilize either direct cesium-surface ionization, or a plasma seeded with cesium to form positive ion beams for sputtering sample materials from which negative ion beams are generated. This article will include a brief review of the fundamental processes underlying negative ion formation by the sputter technique, as well as describe a selected number of recent ion source developments which exemplify the state-of-the art of this technology.

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页码：1141 / 1147

页数：7

相关论文

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