HIGH-INTENSITY PLASMA-SPUTTER HEAVY NEGATIVE-ION SOURCE

被引：15

作者：

ALTON, GD ^{[1
]}

MORI, Y ^{[1
]}

TAKAGI, A ^{[1
]}

UENO, A ^{[1
]}

FUKUMOTO, S ^{[1
]}

机构：

[1] NATL LAB HIGH ENERGY PHYS,TSUKUBA,IBARAKI 305,JAPAN

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1990年 / 61卷 / 01期

关键词：

D O I：

10.1063/1.1141298

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A multicusp magnetic field plasma-surface ion source, normally used for H-ion-beam formation, has been modified for the generation of high-intensity, pulsed, heavy-negative-ion beams suitable for a variety of uses. A brief description of the source and basic pulsed-mode operational data (e.g., intensity versus cesium oven temperature, sputter probe voltage, and discharge pressure) are given. In addition, illustrative examples of intensity versus time and the mass distributions of ion beams extracted from a number of samples, along with emittance data, are also presented. Preliminary results obtained during dc operation of the source under low-discharge-power conditions suggest that sources of this type may alo be used to produce high-intensity (mA) dc beams.

引用

页码：372 / 377

页数：6

共 13 条

[1] A HIGH BRIGHTNESS PLASMA SPUTTER HEAVY NEGATIVE-ION SOURCE [J].