ENHANCED ADHESION AT OXIDE OXIDE INTERFACES BY ION-BEAM STITCHING

被引:7
作者
MUSKET, RG
THOMAS, IM
WILDER, JG
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D O I
10.1063/1.99425
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O59 [应用物理学];
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页码:410 / 412
页数:3
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共 22 条
[1]   ELECTRONIC EXCITATION IN ELECTRON-BOMBARDMENT ENHANCEMENT OF CHEMICAL-REACTIONS [J].
ASHBY, CIH .
APPLIED PHYSICS LETTERS, 1983, 43 (06) :609-611
[2]   ION-BEAM BONDING OF THIN-FILMS [J].
BAGLIN, JEE ;
CLARK, GJ .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 7-8 (MAR) :881-885
[3]  
BAGLIN JEE, 1984, MATER RES SOC S P, V25, P179
[4]  
BAGLIN JEE, 1985, MATER RES SOC S P, V47, P3
[5]  
BOTTIGER J, 1984, MATER RES SOC S P, V25, P203
[6]   ION-BEAM-ENHANCED ADHESION IN THE ELECTRONIC STOPPING REGION [J].
GRIFFITH, JE ;
QIU, Y ;
TOMBRELLO, TA .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1982, 198 (2-3) :607-609
[7]   POSSIBLE NEW SPUTTERING MECHANISM IN TRACK REGISTERING MATERIALS [J].
HAFF, PK .
APPLIED PHYSICS LETTERS, 1976, 29 (08) :473-475
[8]   ENHANCEMENT OF THIN METALLIC FILM ADHESION FOLLOWING VACUUM ULTRAVIOLET-IRRADIATION [J].
MITCHELL, IV ;
NYBERG, G ;
ELLIMAN, RG .
APPLIED PHYSICS LETTERS, 1984, 45 (02) :137-139
[9]   THIN-FILM ADHESION CHANGES INDUCED BY ELECTRON-IRRADIATION [J].
MITCHELL, IV ;
WILLIAMS, JS ;
SMITH, P ;
ELLIMAN, RG .
APPLIED PHYSICS LETTERS, 1984, 44 (02) :193-195
[10]  
MITCHELL IV, 1984, MATER RES SOC S P, V25, P189