STRUCTURE AND ELECTRICAL PROPERTIES OF THIN OXIDE FILM DIODE WITH SPUTTERED TITANIUM BASE

被引：3

作者：

IKUSHIMA, H

HAYAKAWA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1967年 / 6卷 / 07期

关键词：

D O I：

10.1143/JJAP.6.906

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：906 / &

相关论文

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[3] Huber F., 1965, MICROELECTRON RELIAB, V4, P283
[4] ION SIZE EFFECT AND MECHANISM OF ELECTROLYTIC RECTIFICATION
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