ANGLE OF INCIDENCE VARIATION OF SPUTTERING OF GERMANIUM

被引：3

作者：

CHINI, TK ^{[1
]}

BHATTACHARYYA, SR ^{[1
]}

BASU, D ^{[1
]}

BIERSACK, JP ^{[1
]}

机构：

[1] HAHN MEITNER INST BERLIN GMBH,D-14109 BERLIN,GERMANY

来源：

RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1994年 / 127卷 / 3-4期

关键词：

GERMANIUM SPUTTERING; ANGULAR DEPENDENCE OF SPUTTERING YIELDS;

D O I：

10.1080/10420159408221043

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

The angular dependence of the physical sputtering yield of germanium bombarded by Ar+ ions has been studied at 23 keV and 30 keV. The sputtering yield increases with increasing incident angle and reaches a maximum around 70 degrees to 75 degrees. Results are compared with other experimental data and are discussed in the light of predictions of the existing theoretical and semiempirical models.

引用

页码：349 / 355

页数：7

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