DIFFUSION OF SILICON IN AMORPHOUS SILICA

被引：216

作者：

BREBEC, G ^{[1
]}

SEGUIN, R ^{[1
]}

SELLA, C ^{[1
]}

BEVENOT, J ^{[1
]}

MARTIN, JC ^{[1
]}

机构：

[1] CNRS,LPM,F-92190 BELLEVUE,FRANCE

来源：

ACTA METALLURGICA | 1980年 / 28卷 / 03期

关键词：

D O I：

10.1016/0001-6160(80)90168-6

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

引用

页码：327 / 333

页数：7

共 24 条

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[5] HAUL R, 1962, Z ELEKTROCHEM, V66, P636
[6] ATOMIC STRUCTURE AND CORRELATION IN VITREOUS SILICA BY X-RAY AND NEUTRON DIFFRACTION
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BUSCHERT, RC
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[J]. JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1967, 28 (03) : 423 - &
[7] DECONVOLUTION METHOD FOR COMPOSITION PROFILING BY AUGER SPUTTERING TECHNIQUE
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[J]. SURFACE SCIENCE, 1976, 55 (01) : 335 - 348
[8] SELF-DIFFUSION IN INTRINSIC SILICON
KALINOWSKI, L
SEGUIN, R
[J]. APPLIED PHYSICS LETTERS, 1979, 35 (03) : 211 - 213
[9] Kennedy J. C., 1964, PHYS CHEM GLASSES-B, V5, P130
[10] KITTEL C, 1970, INTRO PHYSIQUE SOLID, P105