REACTIONS OF SILICON-BASED CERAMICS IN MIXED OXIDATION CHLORINATION ENVIRONMENTS

被引:27
作者
MARRA, JE
KREIDLER, ER
JACOBSON, NS
FOX, DS
机构
[1] OHIO STATE UNIV,DEPT CERAM ENGN,COLUMBUS,OH 43210
[2] NASA,LEWIS RES CTR,CLEVELAND,OH 44135
关键词
Chemical Reactions-- Chlorination - Silica - Silicon and Alloys--Oxidation - Silicon Carbide - Silicon Nitride;
D O I
10.1111/j.1151-2916.1988.tb05793.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The reaction of silicon-based ceramics with 2% Cl2/Ar and 1% Cl2/1% to 20% O2/Ar at 950°C was studied with thermogravimetric analysis and high-pressure mass spectrometry. Pure Si, SiO2, several types of SiC, and Si3N4 were examined. The primary corrosion products were SiCl4(g) and SiO2(s) with smaller amounts of volatile silicon oxychlorides. The reactions appear to occur by chlorine penetration of the SiO2 layer, and gas-phase diffusion of the silicon chlorides away from the sample appears to be rate limiting. Pure SiO2 shows very little reaction than the other materials with Cl2, whereas SiC with excess carbon is more reactive than the other materials with Cl2/O2. Si3N4 shows very little reaction with Cl2. These differences are explained on the basis of thermodynamic and microstructural factors.
引用
收藏
页码:1067 / 1073
页数:7
相关论文
共 38 条
[1]  
BALE CW, 1979, FACT FACTILITY ANAL
[2]  
BARIN I, 1973, THERMOMECHANICAL PRO
[3]  
Barin I., 1977, THERMOMECHANICAL PRO
[4]  
BESMANN TM, 1977, ORNLTM5775 REP
[5]  
BROWNING R, 1987, ADV CERAM MATER, V2, P773
[6]   HIGH-TEMPERATURE ALLOY CORROSION BY HALOGENS [J].
ELLIOTT, P ;
TYREMAN, CJ ;
PRESCOTT, R .
JOURNAL OF METALS, 1985, 37 (07) :20-23
[7]   Volatile Products in the Corrosion of Cr, Mo, Ti, and Four Superalloys Exposed to O(2) Containing H(2)O and Gaseous NaCl [J].
Fryburg, George C. ;
Miller, Robert A. ;
Kohl, Fred J. ;
Stearns, Carl A. .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (11) :1738-1743
[8]  
Grimley R., 1967, CHARACTERIZATION HIG
[9]   KINETICS OF THERMAL GROWTH OF HCI-O2 OXIDES ON SILICON [J].
HIRABAYA.K ;
IWAMURA, J .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (11) :1595-1601
[10]  
IHARA Y, 1982, CORROS SCI, V23, P805