TIME-DEPENDENT VOID NUCLEATION DURING ELECTROMIGRATION

被引：19

作者：

OHRING, M

机构：

来源：

MATERIALS SCIENCE AND ENGINEERING | 1971年 / 7卷 / 03期

关键词：

D O I：

10.1016/0025-5416(71)90114-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：158 / &

共 27 条

[1] ELECTROMIGRATION DAMAGE IN ALUMINUM FILM CONDUCTORS [J].

ATTARDO, MJ ;

ROSENBERG, R .

JOURNAL OF APPLIED PHYSICS, 1970, 41 (06) :2381-+

[2]

ATTARDO MJ, PRIVATE COMMUNICATIO

[3]

BLACK JR, 1969, IEEE T ELECTRON DEVI, VED16, P338

[4] NON-EQUILIBRIUM VACANCY CONCENTRATIONS IN METALS SUBJECT TO THERMAL GRADIENTS AND ELECTRIC FIELDS [J].

BLACKBURN, DA .

PHYSICA STATUS SOLIDI, 1967, 23 (01) :177-+

[5] ELECTROMIGRATION IN THIN AL FILMS [J].

BLECH, IA ;

MEIERAN, ES .

JOURNAL OF APPLIED PHYSICS, 1969, 40 (02) :485-&

[6] SUR LEELECTROLYSE DES ALLIAGES METALLIQUES [J].

BOSVIEUX, C ;

FRIEDEL, J .

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1962, 23 (JAN-F) :123-&

[7] THE KINETICS OF GRAIN BOUNDARY NUCLEATED REACTIONS [J].

CAHN, JW .

ACTA METALLURGICA, 1956, 4 (05) :449-459

[8]

CHABRA D, 1967, EL ABSTR

[9] THE INFLUENCE OF GRAIN BOUNDARIES ON THE NUCLEATION OF SECONDARY PHASES [J].

CLEMM, PJ ;

FISHER, JC .

ACTA METALLURGICA, 1955, 3 (01) :70-73

[10] QUENCHING AND ANNEALING OF LATTICE VACANCIES IN PURE SILVER [J].

DOYAMA, M ;

KOEHLER, JS .

PHYSICAL REVIEW, 1962, 127 (01) :21-&

← 1 2 3 →