CRITICAL VOLUME FRACTION OF CRYSTALLINITY FOR CONDUCTIVITY PERCOLATION IN PHOSPHORUS-DOPED SI-F-H ALLOYS

被引:312
作者
TSU, R
GONZALEZHERNANDEZ, J
CHAO, SS
LEE, SC
TANAKA, K
机构
关键词
D O I
10.1063/1.93133
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:534 / 535
页数:2
相关论文
共 8 条
  • [1] BRODSKY MH, 1977, PHYS REV B, V16, P3556, DOI 10.1103/PhysRevB.16.3556
  • [2] LANDRETH RE, 1979, EPA600279056, P1
  • [3] EVIDENCE OF VOIDS WITHIN AS-DEPOSITED STRUCTURE OF GLASSY SILICON
    MOSS, SC
    GRACZYK, JF
    [J]. PHYSICAL REVIEW LETTERS, 1969, 23 (20) : 1167 - &
  • [4] CRITICAL DENSITY IN PERCOLATION PROCESSES
    SCHER, H
    ZALLEN, R
    [J]. JOURNAL OF CHEMICAL PHYSICS, 1970, 53 (09) : 3759 - &
  • [5] ELECTROREFLECTANCE AND RAMAN-SCATTERING INVESTIGATION OF GLOW-DISCHARGE AMORPHOUS SI-F-H
    TSU, R
    IZU, M
    OVSHINSKY, SR
    POLLAK, FH
    [J]. SOLID STATE COMMUNICATIONS, 1980, 36 (09) : 817 - 822
  • [6] Tsu R., 1981, Defects in Semiconductors. Proceedings of the Materials Research Society Annual Meeting, P445
  • [7] TSU R, 1981, 9TH INT C PHYS AM LI
  • [8] Zallen R., 1979, Fluctuation phenomena, P177