HIGH-FREQUENCY AND LOW-FREQUENCY STEADY-STATE MIS CAPACITANCE

被引:4
作者
NAKHMANSON, RS
机构
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 1980年 / 57卷 / 02期
关键词
D O I
10.1002/pssa.2210570208
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
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页码:515 / 527
页数:13
相关论文
共 10 条
[1]   SURFACE STATES AT STEAM-GROWN SILICON-SILICON DIOXIDE INTERFACES [J].
BERGLUND, CN .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1966, ED13 (10) :701-+
[2]  
CASTAGNE R, 1969, CR ACAD SCI B PHYS, V268, P1578
[3]   A QUASI-STATIC TECHNIQUE FOR MOS C-V AND SURFACE STATE MEASUREMENTS [J].
KUHN, M .
SOLID-STATE ELECTRONICS, 1970, 13 (06) :873-+
[4]   IMPEDANCE OF SEMICONDUCTOR-INSULATOR-METAL CAPACITORS [J].
LEHOVEC, K ;
SLOBODSKOY, A .
SOLID-STATE ELECTRONICS, 1964, 7 (01) :59-79
[5]  
Nakhmanson R. S., 1970, Physica Status Solidi A, V2, P627, DOI 10.1002/pssa.19700020324
[6]  
Nakhmanson R.S., 1964, FIZ TVERD TELA, V6, P1115
[7]   THEORY OF MIS CAPACITANCE [J].
NAKHMANSON, RS .
SOLID-STATE ELECTRONICS, 1976, 19 (09) :745-758
[8]  
NAKHMANSON RS, 1964, THESIS MOSCOW
[9]  
NAKHMANSON RS, 1971, 1970 P INT C PHYS CH, V5, P143
[10]   STATISTICS OF THE RECOMBINATIONS OF HOLES AND ELECTRONS [J].
SHOCKLEY, W ;
READ, WT .
PHYSICAL REVIEW, 1952, 87 (05) :835-842