INFLUENCE OF DEPOSITION PARAMETERS ON LASER-ABLATION DEPOSITED AMORPHOUS-CARBON

被引：11

作者：

BULIR, J

JELINEK, M

VORLICEK, V

CHVOSTOVA, D

SOUKUP, L

机构：

[1] Institute of Physics, Czech Academy of Sciences, 180 40 Prague 8

来源：

JOURNAL OF NON-CRYSTALLINE SOLIDS | 1995年 / 188卷 / 1-2期

关键词：

D O I：

10.1016/0022-3093(95)00184-0

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thin amorphous carbon films were deposited by KrF laser ablation from graphite and glassy carbon targets at different substrate temperatures with beam power density on the target of 3 X 10(8) W cm(-2). The films were characterized by electrical resistivity, spectroscopic ellipsometry, ultraviolet transmission, visible and infrared spectra and Raman spectroscopy. The influence on film properties of substrate temperature during deposition varying from room temperature to 425 degrees C was studied. The influence of the temperature and film thickness on the film buckling was also studied. A film resistivity of 10(8) Omega cm and an optical band gap energy of 1.9 eV was achieved. Raman spectra with low D band(I-D/I-G = 0.46) intensity were obtained.

引用

页码：118 / 124

页数：7

共 26 条

[1]

ASTAPENKO V, 1994, IN PRESS P SPIE, P18

[2] CHEMICAL-STRUCTURE AND PHYSICAL-PROPERTIES OF DIAMOND-LIKE AMORPHOUS-CARBON FILMS PREPARED BY MAGNETRON SPUTTERING [J].