共 9 条
[1]
BRADY H, COMMUNICATION
[2]
GLANG R, 1970, HDB THIN FILM TECHNO, P65
[3]
HASS GA, 1961, THERMIONIC ELECTRON, P13
[4]
TECHNOLOGY AND APPLICATIONS OF BROAD-BEAM ION SOURCES USED IN SPUTTERING .1. ION-SOURCE TECHNOLOGY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1982, 21 (03)
:725-736
[5]
KAUFMAN HR, 1982, J VAC SCI TECHNOL, V21, P737
[6]
IRO2 RADIOFREQUENCY SPUTTERED THIN-FILM PROPERTIES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1986, 4 (03)
:606-607
[8]
ROGERS DB, 1969, INORG CHEM, V8, P811