Mechanical variation of plasma potential, electron temperature and plasma density

被引：29

作者：

Hershkowitz, Noah ^{[1
]}

Cho, Moo-Hyun ^{[2
]}

Pruski, James

机构：

[1] Univ Wisconsin, Dept Nucl Engn & Engn Phys, Madison, WI 53706 USA

[2] Pohang Inst Sci & Technol, Dept Phys, Pohang 790330, South Korea

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 1992年 / 1卷 / 02期

关键词：

D O I：

10.1088/0963-0252/1/2/003

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

It is shown that the plasma potential and electron temperature of capacitively coupled RF plasmas, confined in a multi-dipole plasma device. can be varied by changing the position of a grounded plate located in the surface multi-dipole magnetic field.

引用

页码：87 / 93

页数：7

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