THERMAL ANNEALING STUDY OF AU-TI-W METALLIZATION ON SILICON

被引：24

作者：

BAKER, JE ^{[1
]}

BLATTNER, RJ ^{[1
]}

NADEL, S ^{[1
]}

EVANS, CA ^{[1
]}

NOWICKI, RS ^{[1
]}

机构：

[1] HEWLETT PACKARD CO,CUPERTINO,CA 95014

来源：

THIN SOLID FILMS | 1980年 / 69卷 / 01期

关键词：

D O I：

10.1016/0040-6090(80)90203-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：53 / 62

页数：10

共 12 条

[1]

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[2] MECHANISM OF HIGH-TEMPERATURE INSTABILITY OF CUO-AG THIN-FILM SOLAR ABSORBERS [J].

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EVANS, CA ;

BRAUNDMEIER, AJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (05) :1132-1137

[3]

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[4]

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[5] SOLID-PHASE CRYSTALLIZATION OF SI FILMS IN CONTACT WITH AI LAYERS [J].

HARRIS, JM ;

BLATTNER, RJ ;

WARD, ID ;

EVANS, CA ;

FRASER, HL ;

NICOLET, MA ;

RAMILLER, CL .

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Maissel L.I., 1970, HDB THIN FILM TECHNO

[7] DIFFUSION BARRIERS IN THIN-FILMS [J].

NICOLET, MA .

THIN SOLID FILMS, 1978, 52 (03) :415-443

[8] STUDIES OF TI-W-AU METALLIZATION ON ALUMINUM [J].

NOWICKI, RS ;

HARRIS, JM ;

NICOLET, MA ;

MITCHELL, IV .

THIN SOLID FILMS, 1978, 53 (02) :195-205

[9] EFFECTS OF DEPOSITION PARAMETERS ON PROPERTIES OF RF SPUTTERED MOLYBDENUM FILMS [J].

NOWICKI, RS ;

BUCKLEY, WD ;

MACKINTOSH, WD ;

MITCHELL, IV .

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[10]

NOWICKI RS, 1978, J VAC SCI TECHNOL, V15, P232

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