EFFECTS OF DEPOSITION PARAMETERS ON PROPERTIES OF RF SPUTTERED MOLYBDENUM FILMS

被引：28

作者：

NOWICKI, RS

BUCKLEY, WD

MACKINTOSH, WD

MITCHELL, IV

机构：

[1] ENERGY CONVERSION DEVICES INC, TROY, MI 48084 USA

[2] CHALK RIVER NUCL LABS, CHALK RIVER K0J IJ0, ONTARIO, CANADA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1974年 / 11卷 / 04期

关键词：

D O I：

10.1116/1.1312734

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：675 / 679

页数：5

共 14 条

[1] 7ICROANALYSIS BY DIRECT OBSERVATION OF NUCLEAR REACTIONS USING A 2 MEV VAN-DE-GRAAFF
AMSEL, G
NADAI, JP
DARTEMAR.E
DAVID, D
GIRARD, E
MOULIN, J
[J]. NUCLEAR INSTRUMENTS & METHODS, 1971, 92 (04): : 481 - &
[2] STRESS AND RESISTIVITY CONTROL IN SPUTTERED MOLYBDENUM FILMS AND COMPARISON WITH SPUTTERED GOLD
BLACHMAN, AG
[J]. METALLURGICAL TRANSACTIONS, 1971, 2 (03): : 699 - &
[3] FACE-CENTRED CUBIC MODIFICATION IN SPUTTERED FILMS OF TANTALUM MOLYBDENUM TUNGSTEN RHENIUM HAFNIUM AND ZIRCONIUM
CHOPRA, KL
RANDLETT, MR
DUFF, RH
[J]. PHILOSOPHICAL MAGAZINE, 1967, 16 (140): : 261 - &
[4] CHU WK, UNPUBLISHED
[5] DHEURLE FM, 1966, T METALL SOC AIME, V236, P321
[6] GLANG R, 1967, 3 T INT VAC C 3, V2, P643
[7] HOLLIS MJ, 1972, NUCL INSTRUM METHODS, V103, P337, DOI 10.1016/0029-554X(72)90392-8
[8] SOME SPECIAL PUMPING PROBLEMS ASSOCIATED WITH SPUTTERING APPLICATION
LAMONT, LT
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1973, 10 (01): : 251 - 253
[9] CONTROL OF RF SPUTTERED FILM PROPERTIES THROUGH SUBSTRATE TUNING
LOGAN, JS
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (02) : 172 - &
[10] THIN FILMS DEPOSITED BY BIAS SPUTTERING
MAISSEL, LI
SCHAIBLE, PM
[J]. JOURNAL OF APPLIED PHYSICS, 1965, 36 (01) : 237 - &