CALCULATION OF DEPOSITION RATES IN DIODE SPUTTERING SYSTEMS

被引：302

作者：

WESTWOOD, WD

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 01期

关键词：

D O I：

10.1116/1.569429

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1 / 9

页数：9

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