ADSORPTION OF WELL-ORDERED ZIRCONIUM PHOSPHONATE MULTILAYER FILMS ON HIGH SURFACE-AREA SILICA

被引：112

作者：

HONG, HG ^{[1
]}

SACKETT, DD ^{[1
]}

MALLOUK, TE ^{[1
]}

机构：

[1] UNIV TEXAS,DEPT CHEM & BIOCHEM,AUSTIN,TX 78712

来源：

CHEMISTRY OF MATERIALS | 1991年 / 3卷 / 03期

关键词：

D O I：

10.1021/cm00015a030

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Multilayer films of zirconium 1,8-octanediylbisphosphonate (ZOBP) were grown on the surface of fumed silica (Cab-O-Sil) via a sequential adsorption technique and were characterized by infrared spectroscopy, X-ray powder diffraction, BET measurements, and elemental analysis. Either an organosilane molecule bearing a phosphonic acid group or a Zr(IV) layer grown from ZrOCl2 solution can be used as an anchoring point for subsequent growth of multilayer films. The structure of multilayer films grown on either support was found to be similar to bulk microcrystalline ZOBP. Surface area measurements, X-ray diffraction line widths, and elemental analyses were consistent with a model in which compact, well-ordered multilayers grown in concentric shells on the silica support. The thickness of the individual ZOBP layers was found to be 13.5 angstrom by X-ray diffraction.

引用

页码：521 / 527

页数：7

共 68 条

[1] STRUCTURAL CHARACTERIZATION OF MULTILAYER METAL PHOSPHONATE FILM ON SILICON USING ANGULAR-DEPENDENT X-RAY PHOTOELECTRON-SPECTROSCOPY [J].