EXCESS CARRIER DISPERSION IN CONVENTIONALLY DISPERSIVE AMORPHOUS-SEMICONDUCTORS AND THE MOBILITY-LIFETIME ANOMALY IN A-SI-H

被引:7
作者
MAIN, C
BERKIN, J
BRUGGEMANN, R
MARSHALL, JM
机构
[1] UNIV STUTTGART,INST PHYS ELEKTR,W-7000 STUTTGART 80,GERMANY
[2] UNIV COLL SWANSEA,DEPT MAT ENGN,SWANSEA SA2 8PP,W GLAM,WALES
关键词
D O I
10.1016/S0022-3093(05)80149-8
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The paper describes a numerical method for the simulation of "time-of-flight" transport measurements in amorphous semiconductors. The method is applied in a study of quasi-equilibrium transport such as observed in a-Si:H at T > 250K. It is demonstrated that the mu-tau-product measured by charge-collection methods can be simply an artefact associated with high modes of diffusion loss to the sample electrodes. The results may explain the systematic discrepancy in values of mu-tau measured by different methods.
引用
收藏
页码:439 / 442
页数:4
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