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A HIGH-SPEED PATTERNING CONTROLLER FOR THE EB60 ELECTRON-BEAM LITHOGRAPHY SYSTEM

被引：4
作者：
MOROSAWA, T
SHIBAYAMA, A
MURASHITA, T
FUJINAMI, M
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期
关键词：
D O I：
10.1116/1.583929
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：66 / 69
页数：4
相关论文
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[2]  
DAVIS DE, 1978, SOLID STATE TECHNOL, V61, P21
[3]   EB60 - AN ADVANCED DIRECT WAFER EXPOSURE ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR HIGH-THROUGHPUT, HIGH-PRECISION, SUBMICRON PATTERN WRITING [J].
FUJINAMI, M ;
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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :61-65
[4]   CHARACTERISTICS OF STATIC INDUCTION TRANSISTORS - EFFECTS OF SERIES RESISTANCE [J].
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IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (07) :761-767
[5]  
SHIBAYAMA A, 1984, P IEEE INT S CIRCUIT
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