EB60 - AN ADVANCED DIRECT WAFER EXPOSURE ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR HIGH-THROUGHPUT, HIGH-PRECISION, SUBMICRON PATTERN WRITING

被引：13

作者：

FUJINAMI, M

SHIMAZU, N

HOSOKAWA, T

SHIBAYAMA, A

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583928

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：61 / 65

页数：5

共 7 条

[1] VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .1. SYSTEM-DESIGN
FUJINAMI, M
MATSUDA, T
TAKAMOTO, K
YODA, H
ISHIGA, T
SAITOU, N
KOMODA, T
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 941 - 945
[2] ELECTRON-BEAM OPTICAL-SYSTEM WITH LARGE FIELD COVERAGE FOR SUB-MICRON LITHOGRAPHY
HOSOKAWA, T
MORITA, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 1293 - 1297
[3] AN ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR SUB-MICRON VHSIC DEVICE FABRICATION
KING, HJ
MERRITT, PE
OTTO, OW
OZDEMIR, FS
PASIECZNIK, J
CARROLL, AM
CAVAN, DL
ECKES, W
LIN, LH
VENEKLASEN, L
WIESNER, JC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01): : 106 - 111
[4] Morita H., 1985, Microelectronic Engineering, V3, P53, DOI 10.1016/0167-9317(85)90009-7
[5] A HIGH-SPEED PATTERNING CONTROLLER FOR THE EB60 ELECTRON-BEAM LITHOGRAPHY SYSTEM
MOROSAWA, T
SHIBAYAMA, A
MURASHITA, T
FUJINAMI, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 66 - 69
[6] DEPENDENCE OF MINIMUM LINEWIDTH ON ELECTRON-BEAM PROPERTIES IN SUBMICRON LITHOGRAPHY USING A RECTANGULAR BEAM
OKUBO, T
SAITO, K
TAKAMOTO, K
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (03): : 682 - 685
[7] HIGH-SPEED FLAT GUIDE CERAMIC STAGE FOR ELECTRON-BEAM LITHOGRAPHY SYSTEM
TSUYUZAKI, H
SHIMAZU, N
FUJINAMI, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 280 - 284