VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .1. SYSTEM-DESIGN

被引：26

作者：

FUJINAMI, M ^{[1
]}

MATSUDA, T ^{[1
]}

TAKAMOTO, K ^{[1
]}

YODA, H ^{[1
]}

ISHIGA, T ^{[1
]}

SAITOU, N ^{[1
]}

KOMODA, T ^{[1
]}

机构：

[1] HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO 185,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571195

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：941 / 945

页数：5

共 10 条

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[2] FUJINAMI M, 1979, REV ELEC COMMUN LAB, V27, P97
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[4] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM
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COLLIER, RJ
ALLES, DS
STAFFORD, JW
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 385 - 392
[5] MOORE RD, 1977, P INT C MICROLITHOGR, P153
[6] VARIABLE SPOT SHAPING FOR ELECTRON-BEAM LITHOGRAPHY
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 887 - 890
[7] VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .2. ELECTRON OPTICS
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UNO, Y
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1087 - 1093
[8] ELECTRON-BEAM LITHOGRAPHY USING VECTOR-SCAN TECHNIQUES
SPETH, AJ
WILSON, AD
KERN, A
CHANG, THP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1235 - 1239
[9] PRECISION ELECTRON-BEAM EXPOSURE SYSTEM, EB52
TATSUNO, G
FUJINAMI, M
IWATA, A
KINAMARI, K
[J]. REVUE DE PHYSIQUE APPLIQUEE, 1978, 13 (12): : 705 - 708
[10] VARNELL GR, 1980, J VAC SCI TECHNOL, V16, P1787