VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .2. ELECTRON OPTICS

被引：13

作者：

SAITOU, N ^{[1
]}

OZASA, S ^{[1
]}

KOMODA, T ^{[1
]}

TATSUNO, G ^{[1
]}

UNO, Y ^{[1
]}

机构：

[1] NIPPON TELEGRAPH & TEL PUBL CORP,MUSASHINO ELECT COMMUN LAB,MUSASHINO,TOKYO 180,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571174

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1087 / 1093

页数：7

共 9 条

[1]

CREWE AV, 1978, OPTIK, V50, P205

[2]

CREWE AV, 1978, OPTIK, V52, P337

[3] VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .1. SYSTEM-DESIGN [J].

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MATSUDA, T ;

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SAITOU, N ;

KOMODA, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :941-945

[4]

GOTO N, 1980, 9TH P S EL ION BEAM

[5] NEW IMAGING AND DEFLECTION CONCEPT FOR PROBE-FORMING MICROFABRICATION SYSTEMS [J].

PFEIFFER, HC .

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[6] VARIABLE SPOT SHAPING FOR ELECTRON-BEAM LITHOGRAPHY [J].

PFEIFFER, HC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :887-890

[7]

SASAKI T, 1979, P VLSI C PASADENA, P125

[8] DOUBLE-APERTURE METHOD OF PRODUCING VARIABLY SHAPED WRITING SPOTS FOR ELECTRON LITHOGRAPHY [J].

THOMSON, MGR ;

COLLIER, RJ ;

HERRIOTT, DR .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :891-895

[9] VARIABLE SPOT-SHAPED E-BEAM LITHOGRAPHIC TOOL [J].

WEBER, EV ;

MOORE, RD .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1780-1782

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