DESIGN OF A VARIABLE-APERTURE PROJECTION AND SCANNING SYSTEM FOR ELECTRON-BEAM

被引:43
作者
GOTO, E
SOMA, T
IDESAWA, M
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1978年 / 15卷 / 03期
关键词
Compendex;
D O I
10.1116/1.569620
中图分类号
O59 [应用物理学];
学科分类号
摘要
ELECTRON OPTICS
引用
收藏
页码:883 / 886
页数:4
相关论文
共 7 条
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    MUNRO, E
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1146 - 1150
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  • [4] NEW IMAGING AND DEFLECTION CONCEPT FOR PROBE-FORMING MICROFABRICATION SYSTEMS
    PFEIFFER, HC
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1170 - 1173
  • [5] SOMA T, 1977, OPTIK, V49, P255
  • [6] SOMA T, 1973, J INFORM P SOC JAPAN, V14, P218
  • [7] Yourke H. S., 1976, International Electron Devices Meeting. (Technical digest), P431