ELECTRON-BEAM LITHOGRAPHY USING VECTOR-SCAN TECHNIQUES

被引：27

作者：

SPETH, AJ ^{[1
]}

WILSON, AD ^{[1
]}

KERN, A ^{[1
]}

CHANG, THP ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.568505

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1235 / 1239

页数：5

共 14 条

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[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 376 - 384
[2] BEASLEY JP, 1970, 4 INT C EL ION BEAM, P515
[3] SOME EXPERIMENTAL AND ESTIMATED CHARACTERISTICS OF LANTHANUM HEXABORIDE ROD CATHODE ELECTRON GUN
BROERS, AN
[J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1969, 2 (03): : 273 - &
[4] PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY
CHANG, THP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1271 - 1275
[5] CHANG THP, 1974, 6TH P INT C EL ION B, P205
[6] GREENEICH JS, 1974, J APPL PHYS, V10, P5264
[7] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM
HERRIOTT, DR
COLLIER, RJ
ALLES, DS
STAFFORD, JW
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 385 - 392
[8] KYSER DF, 1974, 6TH P INT C EL ION B, P205
[9] NEW IMAGING AND DEFLECTION CONCEPT FOR PROBE-FORMING MICROFABRICATION SYSTEMS
PFEIFFER, HC
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1170 - 1173
[10] TING CH, 1975, J VAC SCI TECHNOL, V12, P1276