ELECTRON-BEAM OPTICAL-SYSTEM WITH LARGE FIELD COVERAGE FOR SUB-MICRON LITHOGRAPHY

被引：8

作者：

HOSOKAWA, T

MORITA, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582732

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1293 / 1297

页数：5

共 17 条

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[4] HOSOKAWA T, UNPUB J VAC SCI TE B
[5] NEW MAGNETIC-FOCUS STATIC-DEFLECTION SYSTEM FOR A SINGLE-TUBE COLOR CAMERA
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[J]. IEEE TRANSACTIONS ON CONSUMER ELECTRONICS, 1978, 24 (01) : 114 - 118
[6] LENCOVA B, 1981, OPTIK, V58, P25
[7] AVERAGING OF ELECTRON-BEAM ABERRATIONS
MAUER, JL
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 853 - 856
[8] MORITA H, Patent No. 2104281
[9] OHIWA H, 1971, ELECTRON COMMUN JPN, V54, P44
[10] PATTERN FIDELITY IN SUB-MICRON LITHOGRAPHY WITH A RECTANGULAR ELECTRON-BEAM
OKUBO, T
TAKAMOTO, K
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (08): : 1335 - 1341