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AVERAGING OF ELECTRON-BEAM ABERRATIONS
被引:4
作者
:
MAUER, JL
论文数:
0
引用数:
0
h-index:
0
MAUER, JL
机构
:
来源
:
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY
|
1978年
/ 15卷
/ 03期
关键词
:
Compendex;
D O I
:
10.1116/1.569612
中图分类号
:
O59 [应用物理学];
学科分类号
:
摘要
:
ELECTRON BEAMS
引用
收藏
页码:853 / 856
页数:4
相关论文
共 5 条
[1]
THEORY OF ABERRATION MIXING IN ELECTRON-OPTICAL SYSTEMS
HARTE, KJ
论文数:
0
引用数:
0
h-index:
0
机构:
MICRO BIT CORP,LEXINGTON,MA 02173
MICRO BIT CORP,LEXINGTON,MA 02173
HARTE, KJ
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1973,
10
(06):
: 1098
-
1101
[2]
THERMAL VELOCITY EFFECTS IN AXIALLY SYMMETRIC SOLID BEAMS
KIRSTEIN, PT
论文数:
0
引用数:
0
h-index:
0
KIRSTEIN, PT
[J].
JOURNAL OF APPLIED PHYSICS,
1963,
34
(12)
: 3479
-
&
[3]
ELECTRON OPTICS OF AN ELECTRON-BEAM LITHOGRAPHIC SYSTEM
MAUER, JL
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROP DIV LAB,ELECTRON BEAM TECHNOL GRP,E FISHKILL,NY 12533
MAUER, JL
PFEIFFER, HC
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROP DIV LAB,ELECTRON BEAM TECHNOL GRP,E FISHKILL,NY 12533
PFEIFFER, HC
STICKEL, W
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROP DIV LAB,ELECTRON BEAM TECHNOL GRP,E FISHKILL,NY 12533
STICKEL, W
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1977,
21
(06)
: 514
-
521
[4]
MUNRO E, 1974, OPTIK, V39, P450
[5]
CALCULATION OF HEAT-AFFECTED ZONE DURING PULSED ELECTRON-BEAM MACHINING
WELLS, OC
论文数:
0
引用数:
0
h-index:
0
WELLS, OC
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1965,
ED12
(04)
: 224
-
&
←
1
→
共 5 条
[1]
THEORY OF ABERRATION MIXING IN ELECTRON-OPTICAL SYSTEMS
HARTE, KJ
论文数:
0
引用数:
0
h-index:
0
机构:
MICRO BIT CORP,LEXINGTON,MA 02173
MICRO BIT CORP,LEXINGTON,MA 02173
HARTE, KJ
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY,
1973,
10
(06):
: 1098
-
1101
[2]
THERMAL VELOCITY EFFECTS IN AXIALLY SYMMETRIC SOLID BEAMS
KIRSTEIN, PT
论文数:
0
引用数:
0
h-index:
0
KIRSTEIN, PT
[J].
JOURNAL OF APPLIED PHYSICS,
1963,
34
(12)
: 3479
-
&
[3]
ELECTRON OPTICS OF AN ELECTRON-BEAM LITHOGRAPHIC SYSTEM
MAUER, JL
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROP DIV LAB,ELECTRON BEAM TECHNOL GRP,E FISHKILL,NY 12533
MAUER, JL
PFEIFFER, HC
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROP DIV LAB,ELECTRON BEAM TECHNOL GRP,E FISHKILL,NY 12533
PFEIFFER, HC
STICKEL, W
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,SYST PROP DIV LAB,ELECTRON BEAM TECHNOL GRP,E FISHKILL,NY 12533
STICKEL, W
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1977,
21
(06)
: 514
-
521
[4]
MUNRO E, 1974, OPTIK, V39, P450
[5]
CALCULATION OF HEAT-AFFECTED ZONE DURING PULSED ELECTRON-BEAM MACHINING
WELLS, OC
论文数:
0
引用数:
0
h-index:
0
WELLS, OC
[J].
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1965,
ED12
(04)
: 224
-
&
←
1
→