HIGH-SPEED FLAT GUIDE CERAMIC STAGE FOR ELECTRON-BEAM LITHOGRAPHY SYSTEM

被引：11

作者：

TSUYUZAKI, H

SHIMAZU, N

FUJINAMI, M

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1986年 / 4卷 / 01期

关键词：

D O I：

10.1116/1.583313

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：280 / 284

页数：5

共 6 条

[1] VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .1. SYSTEM-DESIGN [J].

FUJINAMI, M ;

MATSUDA, T ;

TAKAMOTO, K ;

YODA, H ;

ISHIGA, T ;

SAITOU, N ;

KOMODA, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :941-945

[2] ELECTRON-BEAM OPTICAL-SYSTEM WITH LARGE FIELD COVERAGE FOR SUB-MICRON LITHOGRAPHY [J].

HOSOKAWA, T ;

MORITA, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :1293-1297

[3] AN ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR SUB-MICRON VHSIC DEVICE FABRICATION [J].

KING, HJ ;

MERRITT, PE ;

OTTO, OW ;

OZDEMIR, FS ;

PASIECZNIK, J ;

CARROLL, AM ;

CAVAN, DL ;

ECKES, W ;

LIN, LH ;

VENEKLASEN, L ;

WIESNER, JC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :106-111

[4] A LARGE-ANGLE ELECTROSTATIC DEFLECTION, VARIABLE SHAPED, ELECTRON-BEAM EXPOSURE SYSTEM [J].

MORIYA, S ;

KOMATSU, K ;

HARADA, K ;

KITAYAMA, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :990-994

[5] YAW CORRECTED PRECISION X-Y-STAGE FOR HIGH-THROUGHPUT ELECTRON-BEAM LITHOGRAPHY SYSTEMS [J].

MORIYAMA, S ;

OZASA, S ;

SAITOU, N .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :102-105

[6] HIGH-SPEED PRECISION X-Y-STAGE [J].

REEDS, J ;

HANSEN, S ;

OTTO, O ;

CARROLL, AM ;

MCCARTHY, DJ ;

RADLEY, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (01) :112-116

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