YAW CORRECTED PRECISION X-Y-STAGE FOR HIGH-THROUGHPUT ELECTRON-BEAM LITHOGRAPHY SYSTEMS

被引：9

作者：

MORIYAMA, S

OZASA, S

SAITOU, N

机构：

[1] Hitachi Ltd, Central Research Lab,, Kokubunji, Jpn, Hitachi Ltd, Central Research Lab, Kokubunji, Jpn

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期

关键词：

D O I：

10.1116/1.583188

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：102 / 105

页数：4

共 8 条

[1] VARIABLY SHAPED ELECTRON-BEAM LITHOGRAPHY SYSTEM, EB55 .1. SYSTEM-DESIGN [J].

FUJINAMI, M ;

MATSUDA, T ;

TAKAMOTO, K ;

YODA, H ;

ISHIGA, T ;

SAITOU, N ;

KOMODA, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :941-945

[2] A LARGE-ANGLE ELECTROSTATIC DEFLECTION, VARIABLE SHAPED, ELECTRON-BEAM EXPOSURE SYSTEM [J].

MORIYA, S ;

KOMATSU, K ;

HARADA, K ;

KITAYAMA, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04) :990-994

[3] DIGITALLY POSITIONED MECHANICAL STAGE [J].

PASIECZNIK, J ;

REEDS, JW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :909-912

[4]

SAITOU N, 1985, J VAC SCI B, V3, P94

[5]

UCHIYAMA Y, 1977, J JPN SOC LUBRI ENG, V122, P561

[6] HIGH-SPEED, LOW-OVERHEAD ELECTRON-BEAM DIRECT SLICE WRITING SYSTEM [J].

VARNELL, GL ;

SPICER, DF ;

HEBLEY, J ;

ROBBINS, R ;

CARPENTER, C ;

MALONE, M .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1787-1793

[7] VIBRATION ANALYSIS USING THE STRIPE SCAN METHOD OF A LASER INTERFEROMETER CONTROLLED X-Y TABLE IN AN ELECTRON-BEAM SYSTEM [J].

WILSON, AD ;

STUDWELL, T .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06) :1819-1823

[8] ELECTRON-BEAM SYSTEMS FOR PRECISION MICRON AND SUB-MICRON LITHOGRAPHY [J].

WILSON, AD .

PROCEEDINGS OF THE IEEE, 1983, 71 (05) :575-584

← 1 →