HIGH-SPEED, LOW-OVERHEAD ELECTRON-BEAM DIRECT SLICE WRITING SYSTEM

被引：16

作者：

VARNELL, GL

SPICER, DF

HEBLEY, J

ROBBINS, R

CARPENTER, C

MALONE, M

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570295

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1787 / 1793

页数：7

共 15 条

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[5] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM
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ALLES, DS
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[6] Mauer J. L., 1976, International Electron Devices Meeting. (Technical digest), P434
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PEARCEPERCY, HT
SPICER, DF
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VARNELL, GL
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[8] VARIABLE SPOT SHAPING FOR ELECTRON-BEAM LITHOGRAPHY
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 887 - 890
[9] ELECTRON-BEAM LITHOGRAPHY USING VECTOR-SCAN TECHNIQUES
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WILSON, AD
KERN, A
CHANG, THP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1235 - 1239
[10] TROTEL J, 1976, MAY P ECS M WASH