HIGH-SPEED ELECTRON OPTICS FOR DIRECT SLICE WRITING

被引：1

作者：

PEARCEPERCY, HT

SPICER, DF

ABBOT, M

WINBORN, C

VARNELL, GL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.570296

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1794 / 1799

页数：6

共 11 条

[1] DESIGN OF FAST DEFLECTION COILS FOR AN ELECTRON-BEAM MICROFABRICATION SYSTEM
AMBOSS, K
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1152 - 1155
[2] DEFLECTION DISTORTION IN SCANNING ELECTRON-BEAM SYSTEMS
CHANG, THP
VISWANATHAN, R
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 878 - 882
[3] EBES - PRACTICAL ELECTRON LITHOGRAPHIC SYSTEM
HERRIOTT, DR
COLLIER, RJ
ALLES, DS
STAFFORD, JW
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 385 - 392
[4] DESIGN ASPECTS OF A SCANNING ELECTRON-BEAM-MICROFABRICATION INSTRUMENT HAVING 10X10 MM FIELD COVERAGE, NORMAL SUBSTRATE INCIDENCE, AND HIGH THROUGHPUT
JONES, GAC
OWEN, G
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 896 - 900
[5] ELECTRON OPTICS OF AN ELECTRON-BEAM LITHOGRAPHIC SYSTEM
MAUER, JL
PFEIFFER, HC
STICKEL, W
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1977, 21 (06) : 514 - 521
[6] DESIGN AND OPTIMIZATION OF MAGNETIC LENSES AND DEFLECTION SYSTEMS FOR ELECTRON-BEAMS
MUNRO, E
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1146 - 1150
[7] DESIGN OF ELECTRON-BEAM SCANNING SYSTEMS USING MOVING OBJECTIVE LENS
OHIWA, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 849 - 852
[8] PEARCEPERCY HT, MICROCIRCUIT ENGINEE
[9] ELECTRON-BEAM LITHOGRAPHY USING VECTOR-SCAN TECHNIQUES
SPETH, AJ
WILSON, AD
KERN, A
CHANG, THP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (06): : 1235 - 1239
[10] HIGH-SPEED, LOW-OVERHEAD ELECTRON-BEAM DIRECT SLICE WRITING SYSTEM
VARNELL, GL
SPICER, DF
HEBLEY, J
ROBBINS, R
CARPENTER, C
MALONE, M
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1787 - 1793

← 1 2 →